Apparatus for depositing a thin film
AssigneeSamsung Electronics Co., Ltd.
InventorsSeung-Min Ryu, Sang Min Lee, Hee Jong Jeong, Chaeho Kim, Ji Su Son, Jaebong Lee, Juwan Lim, Jungwoo Choi
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Abstract
An apparatus is provided for depositing a thin film. The apparatus includes a chamber, a susceptor disposed in the chamber and supporting a substrate, a reflection housing disposed outside the chamber, a light source unit disposed in the reflection housing and irradiating light to the susceptor, and a light controlling unit blocking at least a portion of an irradiation path of the light to control an irradiation area of the light on the susceptor. At least a portion of the light controlling unit is disposed in the reflection housing.
Claims13
An apparatus for depositing a thin film, the apparatus comprising:
- a chamber;
- a susceptor disposed in the chamber, the susceptor is configured to support a substrate;
- a reflection housing disposed outside the chamber;
- a light source unit disposed in the reflection housing, the light source unit irradiating light to the susceptor;
- and
- a light controlling unit blocking at least a portion of an irradiation path of the light to control an irradiation area of the light on the susceptor,
- wherein at least a portion of the light controlling unit is disposed between the light source, unit and the susceptor, and
- wherein the light controlling unit comprises:
- a blocking part blocking the at least a portion of the irradiation path of the light so that a portion of the light is prevented from arriving at the susceptor;
- a base part attached fixedly to the chamber;
- a supporting part connecting the blocking part to the base part;
- and wherein the light controlling unit is disposed in the reflection housing.
An apparatus for depositing a thin film, the apparatus comprising:
- a chamber;
- a susceptor disposed in the chamber, the susceptor is configured to support a substrate;
- a reflection housing disposed outside the chamber;
- a light source unit disposed above the susceptor, the light source unit irradiating light toward the susceptor;
- and
- a light controlling unit disposed between the light source unit and the susceptor to control an irradiation area of the light directed to the susceptor,
- a preheating ring configured to preheat the process gas to a predetermined temperature so as to pyrolyze the process gas;
- a gas injection part injecting a process gas for depositing a thin film on the substrate into the chamber;
- a gas exhaust part disposed to the opposite to the gas injection part respective to the susceptor, the gas exhaust part exhausting the process gas, and wherein the light controlling unit is disposed in the reflection housing.
Dependencies are inferred from the claim text.