Advanced coating method and materials to prevent HDP-CVD chamber arcing

A ring shaped gas distributor for distributing seasoning gas in a lower portion of a plasma processing chamber below a substrate support of the plasma processing chamber, comprising:

• a ring shaped body having a semi-toroidal shape with a first portion having a first diameter and a second portion having a second diameter, the first diameter greater than the second diameter, the ring shaped body having a flat surface and a curved surface defining a volume therein, the flat surface extending from the first portion to the second portion;
• at least one gas entrance port formed through the curved surface of the ring shaped body;
• and
• a plurality of gas distribution ports formed through the curved surface of the ring shaped body, the plurality of gas distribution ports arranged in a plurality of evenly distributed rows, wherein the plurality of gas distribution ports in a first row of the plurality of evenly distributed rows adapted to direct a gas at an exit angle different from an exit angle of the plurality of gas distribution ports in a second row of the plurality of evenly distributed rows, and at least one of the gas distribution ports is configured to direct gas outward relative to a centerline of the ring shaped gas distributor.

A ring shaped gas distributor for distributing gas in a lower portion of a plasma processing chamber below a substrate support of the plasma processing chamber, comprising:

• a ring shaped body having a semi-toroidal shape with a first portion having a first diameter and a second portion having a second diameter, the first diameter greater than the second diameter, the ring shaped body having a flat surface and a curved surface defining a volume therein, the flat surface extending from the first portion to the second portion, the volume having a semicircular cross section;
• at least one gas entrance port formed through the curved surface of the ring shaped body;
• and
• a plurality of gas distribution ports formed through the curved surface of the ring shaped body, wherein the plurality of gas distribution ports are arranged in a plurality of evenly distributed rows, and wherein the plurality of gas distribution ports in a first row of the plurality of evenly distributed rows is adapted to direct gas at an exit angle different from an exit angle of the plurality of gas distribution ports in a second row of the plurality of evenly distributed rows, at least one of the gas distribution ports is configured to direct gas outward relative to a centerline of the ring shaped gas distributor, and a variation of exit angles between adjacent rows of the plurality of evenly distributed rows is between 15 degrees and 30 degrees.