US 10,208,273 B2 · Drain formulation for enhanced hair dissolution

Abstract

The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.

Claims15

Dependent claims

A drain cleaning composition consisting of:

(a) 4% to 12% by weight of a hypochlorite oxidizing agent;
(b) greater than 3% to 10% by weight of a hydroxide;
(c) a charged surfactant which is an anionic surfactant selected from the group consisting of coconut fatty acid, sodium lauryl sulfate, alkyl benzene sulfonate, and mixtures thereof;
and
(d) an uncharged surfactant which is one or more amine oxides;
(e) water;
(f) optionally, one or more adjuvants selected from the group consisting of:
coloring agents, dyes, pigments, fragrances, opacifiers, corrosion inhibitors and any combinations thereof;
wherein a ratio by weight of charged surfactant to uncharged surfactant is from 1:12 to 1:50;
and the composition is monophasic and viscoelastic and has a viscosity of at least 250 cP at 10/s, a zero-shear viscosity of at least 1000 cP at 25° C. and a critical shear rate of at least 1/sec.

7 more elements

Dependencies are inferred from the claim text.

Drain formulation for enhanced hair dissolution

Life of this patent

Drain formulation for enhanced hair dissolution

Life of this patent

Abstract

Claims15