Cylindrical base, master and master manufacturing method

A method for manufacturing a master comprising:

• a resist depositing step of depositing a resist layer onto an outer circumference surface of a cylindrical base comprising a quartz glass in a cylindrical shape, wherein the cylindrical base has an internal strain in terms of birefringence of less than 70 nm/cm and waviness on the outer circumference surface thereof having a period of 10 mm or less in the circumferential direction has an amplitude of less than 100 nm;
• an exposure step of forming a latent image on the resist layer;
• a developing step of developing the resist layer having the latent image formed thereon;
• and
• an etching step of etching the cylindrical base by using a pattern of the developed resist layer as a mask to form a structure having a plurality of concaves or convexes onto the outer circumference surface of the cylindrical base,
• wherein the latent image is formed by rotating the cylindrical base, irradiating a laser light to the resist layer and moving the laser light in the axial dimension of the cylindrical base in the exposure step, and
• wherein the latent image is formed by thermal lithography in the exposure step.