Method for washing treatment tool stand
AssigneeFUJIFILM Corporation
InventorsSouta Hirano, Tomohiro Ohki, Kazuya Takeuchi
Life of this patent
Estimating the term…
Loading patent…
AssigneeFUJIFILM Corporation
InventorsSouta Hirano, Tomohiro Ohki, Kazuya Takeuchi
Estimating the term…
A method for washing a treatment tool stand of an endoscope using a stand washing tool having a first washing member formed to a first height position and a second washing member formed to a second height position lower than the first height position. The washing method comprises a first washing member inserting step of inserting the first washing member into a gap between a stand storage wall section of the endoscope and the treatment tool stand; a second washing member abutting step of making the second washing member abut against a treatment tool guide surface of the treatment tool stand; and a stand washing tool moving step of moving the stand washing tool along the treatment tool guide surface in a state where the first washing member is inserted into the gap and the second washing member is made to abut against the treatment tool guide surface.
A method for washing a treatment tool stand of an endoscope, using a stand washing tool having
A method for washing a treatment tool stand of an endoscope, using a stand washing tool having
A method for washing a treatment tool stand of an endoscope, using a stand washing tool having
A method for washing a treatment tool stand of an endoscope, using a stand washing tool having
Dependencies are inferred from the claim text.