High power ion beam generator systems and methods

A system comprising:

• a) a computer processor;
• b) non-transitory computer memory comprising one or more computer programs and a database, wherein said one or more computer programs comprises accelerator system monitoring and/or optimization software, and
• c) an accelerator system that generates a high-energy ion beam comprising one or more of the following sub-systems which are in operable communication with said non-transitory computer memory, and which can be automatically adjusted by said accelerator system monitoring and/or optimization software:
• i) an ion source and an ion source monitoring component;
• ii) a focus solenoid magnet and a focus solenoid magnet monitoring component;
• iii) a tube aperture and a tube aperture monitoring component;
• iv) a solid or gas target and a solid or gas target monitoring component;
• v) an extraction and suppression component and an extraction and suppression monitoring component;
• vi) a beam generating sub-system and beam generating sub-system monitoring component;
• vii) a beam focusing and steering sub-system and beam focusing and steering sub-system monitoring component;
• viii) an accelerator/resistor sub-system and accelerator/resistor sub-system monitoring component;
• ix) a beam steering sub-system and a beam steering sub-system monitoring component;
• and
• x) pressurized gas sub-system component and a pressurized gas sub-system component monitoring component.

A system comprising:

• an ion source plasma chamber,
• wherein said plasma chamber has a source axis along the direction of a beam exiting said plasma chamber,
• b) at least one ion source magnet,
• wherein said at least one ion source magnet comprises an opening and at least one outer wall,
• wherein said ion source plasma chamber extends through said opening of said at least one ion source magnet;
• c) at least one receiving component attached to, or integral with, said at least one outer wall of said at least one ion source magnet;
• d) a ferromagnetic enclosure,
• wherein said at least one ion source magnet and said ion source plasma chamber are inside said ferromagnetic enclosure,
• wherein said at least one ion source magnet is able to move to a plurality of different positions inside said ferromagnetic enclosure along said source axis of said plasma chamber;
• wherein there is at least one longitudinal opening that extends along the direction of said source axis and aligns with said receiving component;
• and
• e) at least one adjustment component configured to extend through said longitudinal opening and attach to said receiving component,
• wherein said at least one adjustment component is able to secure said at least one ion source magnet at said plurality of different positions inside said ferromagnetic enclosure.