Temperature control mechanism, temperature control method and substrate processing apparatus

A temperature control mechanism comprising:

• a plurality of combinations of a heater and a thyristor, wherein at least one combination of the heater and the thyristor is provided on a zone-by-zone basis, and wherein an area of an electrostatic chuck for mounting a substrate is divided into a plurality of zones;
• a power supply configured to supply current to heaters of the plurality of combinations respectively through thyristors of the plurality of combinations;
• and
• a pair of filters disposed at a power supply line for supplying electric power from the power supply to the heaters and configured to eliminate high frequency power applied to the power supply, the pair of filters including a first filter provided to an input side relative to the heater and a second filter provided to an output side relative to the heater.