Method and apparatus for drying substrate
AssigneeSemes Co., Ltd.
InventorsBoong Kim, Min Sung Han, Joo Jib Park, Woo Young Kim
Life of this patent
Estimating the term…
Abstract
Disclosed is a substrate drying apparatus of substrate processing apparatus including a chamber that provides a space for processing a substrate, and a fluid supply unit that supplies a process fluid to the chamber, wherein the liquid supply unit includes a supply tank in which the fluid is stored, a supply line that connects the supply tank and the chamber, a branch line branched from a first point of the supply line and connected to a second point of the supply line, and a temperature control unit that adjusts the temperature of the fluid such that the temperatures of the fluids flowing through the supply line and the branch line between the first point and the second point are different.
Claims16
A substrate drying apparatus comprising:
- a chamber configured to provide a space for processing a substrate;
- a fluid supply unit configured to supply a process fluid to the chamber;
- and
- a controller configured to control the fluid supply unit to the chamber,
- wherein the fluid supply unit includes:
- a supply tank in which the process fluid is stored;
- a supply line configured to connect the supply tank and the chamber;
- a branch line branched from a first point of the supply line and connected to a second point of the supply line;
- and
- a temperature control unit configured to adjust a temperature of the process fluid such that a temperature of the process fluid flowing through the supply line and a temperature of the process fluid flowing through the branch line between the first point and the second point are different,
- wherein the controller is configured to control the process fluid supplied into the chamber;
- and to control the process fluid exhausted from the chamber, the controller is configured to repeat the supplying and the exhausting n times (n is a natural number equal to or greater than 2), wherein a temperature of the process fluid supplied into the chamber in a m-th supply operation is lower than a temperature of the process fluid supplied into the chamber in a (m−1)-th supply operation (m is a natural number of 2≤m≤n).
A substrate drying apparatus comprising:
- a chamber configured to provide a space for processing a substrate;
- and
- a fluid supply unit configured to supply a process fluid to the chamber,
- wherein the fluid supply unit includes:
- a supply tank in which the process fluid is stored;
- a supply line configured to connect the supply tank and the chamber;
- a temperature control unit provided in the supply line configured to adjust a temperature of the fluid flowing through the supply line;
- and
- a controller configured to control the fluid supply unit and processes of processing a substrate in the chamber,
- wherein the controller is configured to control the process fluid supplied into the chamber;
- and to control the process fluid exhausted from the chamber, the controller is configured to repeat the supplying and the exhausting n times (n is a natural number equal to or greater than 2), wherein a temperature of the process fluid supplied into the chamber in a m-th supply operation is lower than a temperature of the process fluid supplied into the chamber in a (m−1)-th supply operation (m is a natural number of 2≤m≤n).
A substrate drying method of removing a residual liquid residing on a substrate in a chamber by using a supercritical fluid comprising:
- supplying the supercritical fluid into the chamber;
- and
- exhausting the supercritical fluid, in which the residual liquid is dissolved, from the chamber,
- wherein the supplying and the exhausting are repeated n times (n is a natural number equal to or greater than 2), and a temperature of the supercritical fluid supplied into the chamber in a m-th supply operation is lower than a temperature of the supercritical fluid supplied into the chamber in a (m−1)-th supply operation (m is a natural number of 2≤m≤n).
Dependencies are inferred from the claim text.