Resist underlayer film-forming composition
AssigneeNissan Chemical Industries, Ltd.
InventorsHirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo, Rikimaru Sakamoto
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Abstract
The present invention provides a novel resist underlayer film-forming composition capable of forming a resist underlayer film that has etching resistance and excellent embeddability in a surface having concave portions and/or convex portions. A resist underlayer film-forming composition comprising a polymer having a structural unit represented by formula (1) or formula (2): (wherein X is an arylene group, n is 1 or 2, and R1, R2, R3, and R4 are each independently a hydrogen atom, a hydroxy group, a C1-3 alkyl group, or a phenyl group), and a solvent.
Claims11
A resist underlayer film-forming composition comprising a polymer having a structural unit of the following Formula (1):
- wherein X is an arylene group, n is 1 or 2, and R1, R2, R3, and R4 are each independently a hydrogen atom, a hydroxy group, a C1-3 alkyl group, or a phenyl group, and a solvent.
Dependencies are inferred from the claim text.