Passivation layer comprising a photocrosslinked fluoropolymer
AssigneeThe Chemours Company Fc, LLC
InventorsRalph Birchard Lloyd, James F Ryley, Robert Clayton Wheland, Sung Jin Chung
Life of this patent
Estimating the term…
Abstract
The present disclosure relates to a passivation layer comprising a photocrosslinked fluoropolymer and a process for forming the layer. Passivation layers comprising the crosslinked fluoropolymer have low dielectric constants, low water absorptivity and are able to be photoimaged so as to provide the very fine features needed for modern electronic equipment.
Claims30
A passivation layer comprising a layer of a photocrosslinked coating composition disposed on at least a portion of a substrate, wherein the coating composition consists essentially of:
- i) a photocrosslinkable fluoropolymer having repeat units comprising:
- (a) a fluoroolefin;
- (b) an alkyl vinyl ether wherein the alkyl group is a C1 to C6 straight or a C3 to C6 branched or cyclic saturated hydrocarbon radical;
- and
- (c) a vinyl epoxide;
- ii) a photoacid generator;
- iii) an optional photosensitizer;
- and
- iv) a carrier medium;
- wherein the photocrosslinkable fluoropolymer has a number average molecular weight in the range of from 20,000 to 300,000, and, wherein the layer of photocrosslinked coating composition has a dielectric constant in the range of from 1 to 5 when measured at 100 kHz, and wherein the layer of the photocrosslinked coating composition having a thickness in the range of from 0.01 micrometers to 300 micrometers has photocrosslinked features having a minimum width that is the larger of a) about 10 percent the thickness of the coating composition or b) 0.5 micrometers.
A process comprising:
- (1) providing a photocrosslinkable coating composition consisting essentially of:
- i) a photocrosslinkable fluoropolymer comprising:
- (a) a fluoroolefin;
- (b) an alkyl vinyl ether wherein the alkyl group is a C1 to C6 straight or a C3 to C6 branched or cyclic saturated hydrocarbon radical;
- (c) a vinyl epoxide;
- and
- (d) optionally, other monomers;
- and
- ii) a photoacid generator;
- iii) an optional photosensitizer;
- and
- iv) a carrier medium;
- (2) applying a layer of the photocrosslinkable coating composition onto at least a portion of a substrate;
- (3) removing at least a portion of the carrier medium;
- (4) irradiating at least a portion of the layer of the photocrosslinkable coating composition with ultraviolet light;
- (5) heating the applied layer of photocrosslinkable coating composition;
- and
- (6) removing at least a portion of the uncrosslinked photocrosslinkable fluoropolymer;
- wherein the photocrosslinkable fluoropolymer has a number average molecular weight in the range of from 20,000 to 300,000, and, wherein the layer of photocrosslinked coating composition has a dielectric constant in the range of from 1 to 5 when measured at 100 kHz, and wherein a layer of the photocrosslinked coating composition having a thickness in the range of from 0.01 micrometers to 300 micrometers has photocrosslinked features having a minimum width that is the larger of a) about 10 percent the thickness of the coating composition or b) 0.5 micrometers.
Dependencies are inferred from the claim text.