Method and apparatus for filling a gap
AssigneeASM IP Holding B.V.
InventorViljami Pore
Life of this patent
Estimating the term…
Abstract
A method and apparatus for filling one or more gaps created during manufacturing of a feature on a substrate by: providing a bottom area of a surface of the one or more gaps with a first reactant; providing a second reactant to the substrate; and, allowing the first reactant to initiate reaction of the second reactant in the bottom area of the surface in a stoichiometric ratio of one molecule of the first reactant to multiple molecules of the second reactants leaving a top area of the surface of the one or more gaps which was not provided with the first reactant initially substantially empty.
Claims19
A method for filling one or more gaps created during manufacturing of a feature on a substrate by a deposition method comprising:
- providing a bottom area of a surface of the one or more gaps with a first reactant;
- providing a second reactant to the substrate;
- allowing, in a film deposition cycle, the first reactant to initiate reaction of the second reactant in the bottom area of the surface in a stoichiometric ratio of one molecule of the first reactant to multiple molecules of the second reactant, to form a layer of deposited material in the bottom area, leaving a top area of the surface of the one or more gaps which was not provided with the first reactant initially substantially empty;
- and
- repeating the cycle, such that the deposited material forms layer-by-layer in the one or more gaps from the bottom area upwards,
- wherein providing the bottom area of the surface of the one or more gaps with the first reactant comprises:
- providing a polymer material in the bottom area of the surface;
- infiltrating the polymer material with the first reactant;
- and
- removing the polymer material from the bottom area while allowing the first reactant to remain in the bottom area.
Dependencies are inferred from the claim text.