Method of evaluating characteristics of ion implanted sample
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKuo-Sheng Chuang, You-Hua Chou
Life of this patent
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Abstract
A method of evaluating characteristics of a work piece includes forming a photosensitive layer on the work piece. Then an ion implantation is performed on the work piece. The work piece is radiated, and an optical intensity of the photosensitive material on the work piece is calculated. The ion implantation pattern is evaluated according to the optical intensity. A chemical structure of the photosensitive material is changed upon the ion implantation. The work piece is recovered by reversing the chemical structure of the photosensitive material or removing the ion interrupted photosensitive material by chemicals.
Claims20
A method of evaluating characteristics of a work piece, the method comprising:
- forming a photosensitive layer on a substrate to form the work piece;
- performing ion implantation on the work piece;
- radiating the work piece;
- and
- calculating an optical intensity of the work piece based upon a transmission of light through the work piece from radiating the work piece.
An arrangement, comprising:
- a transparent substrate;
- a photosensitive layer disposed on the transparent substrate, wherein the photosensitive layer has a photochromic material configured to change chemical structure upon ion implantation;
- a light shelter having a platform upon which the transparent substrate is seated;
- and
- a meter matrix configured to measure optical intensity of light transmitted through the transparent substrate and the photosensitive layer.
A method of evaluating characteristics of a work piece, the method comprising:
- providing a light permeable substrate;
- dispensing a photosensitive material on the light permeable substrate to form the work piece, wherein a chemical structure of the photosensitive material changes upon ion implantation;
- performing ion implantation on the work piece;
- radiating the work piece after performing the ion implantation on the work piece;
- and
- calculating an optical intensity of the work piece based upon a transmission of light through the work piece from radiating the work piece.
Dependencies are inferred from the claim text.