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US 10,157,710 B2Granted
Process of forming a photoactive layer of an optoelectronic device
AssigneeCommonwealth Scientific and Industrial Research Organisation
InventorsTimothy William Jones, Gregory Joseph Wilson, Kenrick Forrest Anderson, Anthony Frank Hollenkamp, Noel William Duffy, Nienke Joan Firet
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Abstract
A process of forming a thin film photoactive layer of an optoelectronic device comprising: providing a substrate having a surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In; and converting the metal surface or metal coating of the substrate to a perovskite layer.
Claims17
A process of forming a thin film photoactive layer of an optoelectronic device comprising:
- providing a substrate having a metallic surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In;
- and
- converting the metallic surface of the substrate to a perovskite layer comprising an organo-metal halide perovskite, wherein the converting comprises:
- applying onto the surface of the substrate at least one perovskite precursor comprising at least one compound having a formula AX, or at least one reaction constituent for forming at least one compound having the formula AX, to form the perovskite layer, wherein A comprises a nitrogen-containing organic cation and X is selected from at least one of F, Cl, Br or I.
1 more element
Dependencies are inferred from the claim text.