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US 10,150,048 B2Granted
Method, system, and device for delivery of process gas
AssigneeRASIRC, Inc.
InventorsDaniel Alvarez, Jr., Russell J. Holmes, Jeffrey J. Spiegelman, Edward Heinlein, Christopher Ramos, Jeremiah Trammel
Life of this patent
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Abstract
Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
Claims15
A method comprising:
- (a) providing a non-aqueous solution comprising a process chemical and a solvent in a device configured to contain a liquid and a vapor phase, wherein the non-aqueous solution has a vapor phase comprising an amount of anhydrous vapor of the process chemical;
- (b) contacting a carrier gas or vacuum with the vapor phase to form a gas stream;
- and
- (c) delivering the gas stream comprising the anhydrous vapor to a critical process or application,
- wherein the process chemical is hydrazine and wherein the solvent is selected from the group consisting of ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-Dimethyl-3,4,5,6-tetrahydro-2(1H)-pyrimidinone (DMPU), 1,3-Dimethyl-2-imidazolidinone (DMEU), and tetramethylurea.
2 more elements
Dependencies are inferred from the claim text.