Apparatus for processing materials at high temperatures and pressures
AssigneeSLT Technologies, Inc.
InventorsKirsh Afimiwala, Larry Zeng
Life of this patent
Estimating the term…
Abstract
An apparatus for processing materials at high temperatures comprises a high strength enclosure; a plurality of high strength radial segments disposed adjacent to and radially inward from the high strength enclosure; a liner disposed adjacent to and radially inward from the radical segments; a chamber defined interior to the liner; a heating device disposed within the chamber; and a capsule disposed within the chamber, the capsule configured to hold a supercritical fluid. The apparatus may be used for growing crystals, e.g., GaN, under high temperature and pressure conditions.
Claims37
An apparatus comprising:
- a high strength enclosure;
- a plurality of high strength radial segments disposed adjacent to and radially inward from the high strength enclosure;
- a liner disposed adjacent to and radially inward from the high strength radial segments, the liner comprising one of a high temperature steel or a high temperature metal alloy;
- a chamber that is defined by an inner surface of the liner;
- a heating device disposed within the chamber, the heating device having an outer surface and an inner surface, and defining a cavity radially inward from the inner surface;
- and
- a capsule for growing crystals therein under high temperature and pressure conditions, the capsule being disposed within the cavity of the heating device, and holding reactants and materials, wherein
- a first gap is disposed between the liner and the outer surface of the heating device and the inner surface of the liner,
- the first gap is configured to be filled with a high-pressure gas, and
- the capsule is configured such that there is a second gap between an exterior surface of the capsule and the inner surface of the heating device, and the second gap between the exterior surface of the capsule and the inner surface of the heating device being configured to be filled with a high-pressure gas.
An apparatus comprising:
- a high strength enclosure;
- a plurality of high strength radial segments disposed adjacent to and radially inward from the high strength enclosure, wherein
- the high strength radial segments comprise a material chosen from a ceramic, a refractory metal, a cement, or a combination of two or more thereof;
- a liner disposed adjacent to and radially inward from the high strength radial segments;
- a chamber that is defined by an inner surface of the liner;
- a heating device disposed within the chamber, the heating device having an outer surface an inner surface, and defining a cavity radially inward from the inner surface;
- and
- a capsule for growing crystals therein under high temperature and pressure conditions, the capsule being disposed within the cavity of the heating device, and holding reactants and materials, wherein
- a first gap is disposed between the liner and the outer surface of the heating device,
- a second gap is disposed between an exterior surface of the capsule and the inner surface of the heating device, and
- the first gap and the second gap are configured to be filled with a high-pressure gas.
Dependencies are inferred from the claim text.