Back to results
US 10,138,775 B2Granted
Holding material, method for producing same, and gas treatment device using same
AssigneeNichias Corporation
InventorsKazutoshi Isomura, Hiroki Nakamura, Kiyoshi Sato, Isami Abe
Life of this patent
Estimating the term…
Abstract
A holding material includes a stack of a first mat and a second mat, the first mat including alumina fibers that include 60 wt % or more of alumina and 40 wt % or less of silica, and the second mat including silica fibers that include 60 wt % or more of silica and 40 wt % or less of alumina and having a surface pressure higher than that of the first mat as measured at a gap bulk density of 0.30 g/cm3.
Claims7
A holding material comprising:
- a first mat comprising inorganic fibers of only a first type, the first type of inorganic fibers being alumina fibers that comprise 60 wt % or more of alumina and 40 wt % or less of silica;
- and
- a second mat comprising inorganic fibers of only a second type, the second type of inorganic fibers being silica fibers that comprise 60 wt % or more of silica and 40 wt % or less of alumina, and having a surface pressure higher than that of the first mat as measured at a gap bulk density of 0.30 g/cm3,
- wherein the holding material is configured to be placed in a gap between a processing structure and a casing in a gas treatment device with the processing structure disposed in the casing, such that the first mat of the holding material comes in contact with the processing structure.
1 more element
Dependencies are inferred from the claim text.