Modified hybrid sol-gel solutions and compositions formed from such solutions

A method of forming a solid thin film layer, the method comprising:

• applying a modified hybrid sol-gel precursor solution onto a surface of a substrate,
• the modified hybrid sol-gel precursor solution comprising:
• an inorganic precursor comprising two or more first hydrolysable groups and one of a first metal or a first metalloid,
• wherein the one of the first metal or the first metalloid is covalently bonded to the two or more first hydrolysable groups;
• a cross-linkable inorganic-organic precursor comprising a second metal, a second hydrolysable group, and a first organic molecule,
• wherein the second metal is covalently bound to the second hydrolysable group and is covalently bound to the first organic molecule,
• wherein the first organic molecule comprises a first cross-linking group;
• a cross-linkable organic precursor comprising a second organic molecule,
• wherein the second organic molecule comprises two or more second cross-linking groups;
• a protic solvent;
• and
• an aprotic solvent,
• wherein a weight ratio of the protic solvent and the aprotic solvent in the modified hybrid sol-gel precursor solution is selected to achieve a gelation rate of the inorganic precursor, the cross-linkable inorganic-organic precursor, and the cross-linkable organic precursor;
• and
• curing the modified hybrid sol-gel precursor solution on the surface thereby forming the solid thin film layer
• wherein the first metalloid is selected from the group consisting of boron, germanium, arsenic, antimony, tellurium, bismuth, and polonium, and
• wherein the first metal is selected from the group consisting of transition metals, lanthanides, actinides, alkaline earth metals, and Group IIIA through Group VA metals.