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US 10,131,135 B2Granted
Imprint apparatus and imprint method
AssigneeToshiba Memory Corporation
InventorsYasuo Matsuoka, Hiroshi Nomura, Masahito Hiroshima
Life of this patent
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Abstract
An imprint apparatus according to one embodiment includes a contact processing unit and a defect determination unit. The contact processing unit brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate. The defect determination unit determines a defect in an imprint process, on the basis of force which is generated from at least one of the template, the resist, and the substrate, during the imprint process.
Claims6
An imprint apparatus comprising:
- a contact processing unit that brings a template pattern formed on a front surface of a template into contact with resist placed on a substrate;
- a defect determination unit that determines a defect in an imprint process, on the basis of an acoustic emission wave generated during the imprint process from at least one of the template, the resist, and the substrate, the acoustic emission wave being a wave that is detected at a side surface of the template;
- a first detection unit that detects the acoustic emission wave;
- and
- a holding unit that holds the template by pressing the template from the side surface,
- wherein
- the first detection unit is provided in the holding unit, and
- the holding unit is an actuator that presses the side surface of the template and includes a d33-mode piezoelectric element, a d31-mode piezoelectric element, and the first detection unit that are connected in series.
5 more elements
Dependencies are inferred from the claim text.