# US 10,121,931 B2 · Film formation device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,121,931 B2 - Document ID: US10121931B2 - Status: Granted - Kind: B2 - Application number: 13/990,641 - Filed: 2011-03-15 - Published: 2013-09-26 - Granted: 2018-11-06 - Earliest claimed: 2011-03-15 - Assignees: Toshiba Mitsubishi-Electric Industrial Systems Corporation - Applicants: Hiroyuki Orita; Takahiro Shirahata; Akio Yoshida - Inventors: Hiroyuki Orita; Takahiro Shirahata; Akio Yoshida - Web page: https://patentgrep.com/patent/US10121931B2 ## CPC - H10F 71/137: {Batch treatment of the devices} - B05B 1/04: in flat form, e.g. fan-like, sheet-like - B05B 7/0012: {Apparatus for achieving spraying before discharge from the apparatus} - B05B 7/0416: {with arrangements for mixing one gas and one liquid} - B05B 7/0458: {the gas and liquid flows being perpendicular just upstream the mixing chamber} - C23C 16/4486: {by producing an aerosol and subsequent evaporation of the droplets or particles} - C23C 16/45514: {Mixing in close vicinity to the substrate} - C23C 16/45595: {Atmospheric CVD gas inlets with no enclosed reaction chamber} - H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION - B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES (spray-mixers with nozzles B01F25/72; processes for applying liquids or other fluent materials to surfaces by spraying B05D) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract The present invention includes a mist generator that generates a mist of a raw material of a film to be formed, and a mist jet nozzle that jets the mist generated by the mist generator to a substrate on which a film is to be formed. The mist jet nozzle includes: a main body having a hollow portion; a mist supply port that supplies the mist; a spout that jets the mist to the outside; a carrier gas supply port that supplies a carrier gas; and a shower plate having a plurality of holes formed therein. By the arrangement of the shower plate, the hollow portion is divided into a first space connected to the carrier gas supply port and a second space connected to the spout. The mist supply port is connected to the second space. ## Claims ### Claim 1 A film formation device comprising: a mist generator that generates a mist of a raw material of a film to be formed; and a mist jet nozzle that jets the mist to a substrate on which a film is to be formed, the mist jet nozzle comprising: a main body having a hollow portion; a mist supply port formed in the main body and configured to supply the mist to the inside of the hollow portion; a first spout formed in the main body and configured to jet the mist in the hollow portion to the outside; a carrier gas supply port formed in the main body and configured to supply a carrier gas to the inside of the hollow portion, the carrier gas transporting the mist to the first spout; and a shower plate arranged within the hollow portion and having a plurality of holes formed therein, wherein the hollow portion comprises a first space and a second space divided by the shower plate, the first space is connected to the carrier gas supply port, the second space is connected to the first spout, the mist supply port is formed in the main body so as to be connected to the second space, and a total of opening areas of the plurality of holes formed in the shower plate is smaller than a total of an opening area of the carrier gas supply port. ### Claim 2 (depends on 1) The film formation device according to claim 1, wherein the mist supply port is connected to a mist pipe configured to transport the mist generated by the mist generator to the inside of the hollow portion. ### Claim 3 (depends on 1) The film formation device according to claim 1, wherein the mist generator is directly connected to the main body so as to close the mist supply port. ### Claim 4 (depends on 1) The film formation device according to claim 1, wherein the mist jet nozzle further comprises a temperature adjuster at least in a portion of the main body around the first spout, wherein the temperature adjuster is configured to adjust a temperature of the hollow portion. ### Claim 5 (depends on 4) The film formation device according to claim 4, wherein the temperature adjuster is arranged throughout the main body of the mist gas jet nozzle. ### Claim 6 (depends on 1) The film formation device according to claim 1, further comprising a reaction-promoting-gas jet nozzle comprising a second spout that jets a reaction promoting gas for promoting a decomposition and a reaction of the mist, wherein the first spout and the second spout are adjacent to each other. ### Claim 7 (depends on 1) The film formation device according to claim 1, further comprising an exhaust nozzle comprising an exhaust port. ### Claim 8 (depends on 7) The film formation device according to claim 7, further comprising a reaction-promoting-gas jet nozzle comprising a second spout that jets a reaction promoting gas for promoting a decomposition and a reaction of the mist, wherein the exhaust port, the first spout, and the second spout are arranged adjacent in one direction starting from the exhaust port. ### Claim 9 (depends on 7) The film formation device according to claim 7, wherein a force of exhaust by the exhaust nozzle is equal to a force of jetting by the mist jet nozzle. ### Claim 10 (depends on 1) The film formation device according to claim 1, comprising two or more mist jet nozzles.