# US 10,119,103 B2 · Cleaning liquid and method for cleaning

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- Number: US 10,119,103 B2
- Document ID: US10119103B2
- Status: Granted
- Kind: B2
- Application number: 15/439,162
- Filed: 2017-02-22
- Published: 2017-09-07
- Granted: 2018-11-06
- Earliest claimed: 2016-03-04
- Assignees: Tokyo Ohka Kogyo Co., Ltd.
- Applicants: Tokyo Ohka Kogyo Co., Ltd.
- Inventors: Tatsuo Goto; Kenji Seki
- Web page: https://patentgrep.com/patent/US10119103B2

## CPC

- H10P 70/273: {the processing being a delineation of conductive layers, e.g. by RIE}
- C11D 3/042: {Acids}
- C11D 3/28: Heterocyclic compounds containing nitrogen in the ring
- C11D 3/43: Solvents
- C11D 7/08: Acids
- C11D 7/3281: {Heterocyclic compounds}
- H10P 70/237: {the processing being a planarisation of insulating layers}
- C11D 2111/22: Electronic devices, e.g. PCBs or semiconductors
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- C11D: DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL

## Abstract

A cleaning liquid including hydrofluoric acid, a tetrazole compound, and water. The tetrazole compound may be represented by the following Formula (B1) in which R1 is a hydrogen atom or an organic group and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group.

## Claims

### Claim 1

A cleaning liquid comprising:
hydrofluoric acid;
a tetrazole compound; and
water,
wherein the pH of the cleaning liquid is between 4.77 and 5.27.

### Claim 2 (depends on 1)

The cleaning liquid according to claim 1, wherein the tetrazole compound is represented by the following Formula (B1):
wherein R1 is a hydrogen atom or an organic group and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group.

### Claim 3 (depends on 2)

The cleaning liquid according to claim 2, wherein R1 is a hydrogen atom.

### Claim 4 (depends on 1)

The cleaning liquid according to claim 1, further comprising a basic compound.

### Claim 5 (depends on 1)

The cleaning liquid according to claim 1, further comprising a water-soluble organic solvent.

### Claim 6 (depends on 1)

A method for cleaning a substrate, comprising contacting the substrate with the cleaning liquid according to claim 1.

### Claim 7 (depends on 6)

The method according to claim 6, wherein at least a part of the surface of the substrate is formed of metals containing cobalt.

### Claim 8 (depends on 2)

The cleaning liquid according to claim 2, wherein R1 is an alkyl group optionally substituted with a dialkylamino group.

### Claim 9 (depends on 8)

The cleaning liquid according to claim 8, wherein the tetrazole compound comprises at least a compound represented by any one of the following formulas B3 to B5:

### Claim 10 (depends on 4)

The cleaning liquid according to claim 4, wherein the basic compound comprises tetrahydrofurfurylamine.

### Claim 11 (depends on 1)

The cleaning liquid according to claim 1, consisting essentially of:
hydrofluoric acid;
the tetrazole compound;
water;
a basic compound; and
a water-soluble organic solvent.

### Claim 12

A cleaning liquid comprising:
hydrofluoric acid;
a tetrazole compound; and
water,
wherein the tetrazole compound is represented by the following Formula (B1):
wherein R1 is an alkyl group optionally substituted with a dialkylamino group, and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group or an organic group.

### Claim 13 (depends on 12)

The cleaning liquid according to claim 12, wherein the tetrazole compound comprises at least a compound represented by any one of the following formulas B3 to B5:

### Claim 14 (depends on 12)

The cleaning liquid according to claim 12, further comprising a basic compound, wherein the basic compound comprises tetrahydrofurfurylamine.

### Claim 15

A cleaning liquid consisting essentially of:
hydrofluoric acid;
a tetrazole compound;
water;
a basic compound; and
a water-soluble organic solvent.

### Claim 16 (depends on 15)

The cleaning liquid according to claim 15, wherein the tetrazole compound is represented by the following Formula (B1):
wherein R1 is a hydrogen atom or an organic group and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group or an organic group.

### Claim 17 (depends on 16)

The cleaning liquid according to claim 16, wherein the R1 is an alkyl group optionally substituted with a dialkylamino group.

### Claim 18 (depends on 17)

The cleaning liquid according to claim 17, wherein the tetrazole compound comprises at least a compound represented by any one of the following formulas B3 to B5:

### Claim 19 (depends on 15)

The cleaning liquid according to claim 15, wherein the basic compound comprises tetrahydrofurfurylamine.