# US 10,118,317 B2 · Template and pattern formation method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,118,317 B2 - Document ID: US10118317B2 - Status: Granted - Kind: B2 - Application number: 14/840,625 - Filed: 2015-08-31 - Published: 2016-12-01 - Granted: 2018-11-06 - Earliest claimed: 2015-05-27 - Assignees: Toshiba Memory Corporation - Applicants: Toshiba Memory Corporation - Inventors: Yoshihisa Kawamura; Masayuki Hatano; Yohko Komatsu; Hiroyuki Kashiwagi - Web page: https://patentgrep.com/patent/US10118317B2 ## CPC - B29C 33/424: {Moulding surfaces provided with means for marking or patterning (for injection moulding B29C45/372)} - B29C 43/021: {characterised by the shape of the surface} - B29C 43/36: Moulds for making articles of definite length, i.e. discrete articles - H10P 14/6516: {of treatments performed after formation of the materials} - H10P 14/6538: {by exposure to UV light} - H10P 14/683: {carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC} - B29C 2033/426: {Stampers} - B29C 2043/025: {forming a microstructure, i.e. fine patterning} - B29L 2031/34: Electrical apparatus, e.g. sparking plugs or parts thereof - B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic - B82Y 40/00: Manufacture or treatment of nanostructures - Y10S 977/887: Nanoimprint lithography, i.e. nanostamp - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B29L: INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ## Abstract According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern. ## Claims ### Claim 1 A template comprising: a template pattern formed on a substrate; and a liquid repellent pattern that has liquid repellency to a resist and is disposed on a periphery of a region for arrangement of the template pattern, wherein the liquid repellent pattern includes a portion formed of a concave portion, and a liquid guide portion that guides the resist from the region for arrangement of the template pattern to a periphery of the portion formed of the concave portion, and the liquid guide portion includes a surrounding pattern concentrically surrounding the periphery of the portion formed of the concave portion with a predetermined distance from the portion formed of the concave portion, and a guiding pattern having one end connected to the surrounding pattern, and another end positioned on a side of the region for arrangement of the template pattern. ### Claim 2 (depends on 1) The template according to claim 1, wherein the other end of the guiding pattern is positioned near a pattern at a peripheral edge portion of the region for arrangement of the template pattern. ### Claim 3 (depends on 1) The template according to claim 1, wherein the liquid repellent pattern further includes a liquid collecting portion connected to the other end of the guiding pattern, and that guides the resist, which has flowed to near the other end of the guiding pattern, to the liquid guide portion. ### Claim 4 (depends on 1) The template according to claim 1, wherein the portion formed of the concave portion has a dimension of 0.5 pm or more when seen in a plan view, and the concave portion has a depth of 300 nm or less. ### Claim 5 (depends on 1) The template according to claim 1, wherein the portion formed of the concave portion has a rectangular, circular, elliptical, or polygonal shape, when seen in a plan view. ### Claim 6 (depends on 1) The template according to claim 1, wherein the liquid guide portion has a structure in which a plurality of first concave patterns are arranged at predetermined intervals in a direction perpendicular to an extending direction of the first concave patterns. ### Claim 7 (depends on 6) The template according to claim 6, wherein the first concave patterns have a width of 300 nm or less and a depth of 100 nm or less. ### Claim 8 (depends on 3) The template according to claim 3, wherein the liquid guide portion includes a first concave pattern, and the liquid collecting portion includes a second concave pattern connected to the first concave pattern. ### Claim 9 (depends on 8) The template according to claim 8, wherein the liquid collecting portion is arranged such that the second concave pattern is in a vortical, meandering, or lattice state. ### Claim 10 (depends on 8) The template according to claim 8, wherein the liquid collecting portion is arranged such that one second concave pattern is branched into a plurality of patterns. ### Claim 11 (depends on 1) The template according to claim 1, further comprising propagation delay patterns arranged in parallel with the portions formed of the concave portion, and that delays propagation of the resist. ### Claim 12 (depends on 1) The template according to claim 1, wherein an auxiliary pattern arrangement region is present at an outer periphery of the region for arrangement of the template pattern, main patterns forming a device are arranged in the region for arrangement of the template pattern, alignment marks and the liquid repellent pattern are arranged in the auxiliary pattern arrangement region, and the liquid repellent pattern is arranged at a peripheral edge portion of the auxiliary pattern arrangement region. ### Claim 13 (depends on 12) The template according to claim 12, wherein the substrate has a mesa structure in which a central region protrudes than a peripheral edge region, and the region for arrangement of the template pattern and the auxiliary pattern arrangement region are provided in the central region. ### Claim 14 (depends on 1) The template according to claim 1, wherein a liquid repellent pattern arrangement region is provided at an outer periphery of the region for arrangement of the template pattern, the region for arrangement of the template pattern includes a plurality of chip regions serving as a unit forming a device, and a plurality of dicing regions dividing the chip regions, and the liquid repellent pattern is arranged in the liquid repellent pattern arrangement region. ### Claim 15 (depends on 14) The template according to claim 14, wherein the region for arrangement of the template pattern has a surface area equal to a process object. ### Claim 16 (depends on 14) The template according to claim 14, wherein the template substrate has a mesa structure in which a central region protrudes than a peripheral edge region, and the region for arrangement of the template pattern and the liquid repellent pattern arrangement region are provided in the central region.