# US 10,118,060 B2 · Select Schiff base compounds for chemical agent detoxification

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 10,118,060 B2
- Document ID: US10118060B2
- Status: Granted
- Kind: B2
- Application number: 14/029,952
- Filed: 2013-09-18
- Published: 2015-03-19
- Granted: 2018-11-06
- Earliest claimed: 2013-09-18
- Assignees: The United States of America as represented by the Secretary of the Air Force
- Applicants: The United States of America as Represented by the Secretary of the Air Force
- Inventors: Jeffery Ray Owens; Wallace Bruce Salter; Katherine Moss Simpson
- Web page: https://patentgrep.com/patent/US10118060B2

## CPC

- A62D 3/36: Detoxification by using acid or alkaline reagents
- D06M 13/272: Unsaturated compounds containing sulfur atoms
- D06M 13/335: having an amino group bound to a carbon atom of a six-membered aromatic ring
- D06M 13/352: having five-membered heterocyclic rings
- D06M 13/355: having six-membered heterocyclic rings
- D06M 16/00: Biochemical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. enzymatic
- A62D 2101/02: Chemical warfare substances, e.g. cholinesterase inhibitors
- A62D 2101/22: containing halogen
- A62D 2101/26: containing nitrogen or phosphorus
- A62D 2101/28: containing oxygen, sulfur, selenium or tellurium, i.e. chalcogen
- A62D: CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
- D06M: TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS

## Abstract

A Schiff base compound configured to detoxify a toxic chemical agent. The toxic chemical agent includes at least one leaving group and the Schiff base compound includes an imine having at least one Lewis base and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced way from the electron acceptor by a distance that ranges from about 200 pm to about 1000 pm.

## Claims

### Claim 1

A composition for detoxification of a toxic chemical agent having at least one leaving group, the composition comprising:
8-hydroxyquinoline or 1,2-benzisothiazol-3(2H)-one; and
a cross-linking agent configured to chemically bind 8-hydroxyquinoline or 1,2-benzisothiazol-3(2H)-one to a substrate, wherein the cross-linking agent is a siloxane, an acrylate, an epoxide, or a combination thereof.

### Claim 2 (depends on 1)

The composition of claim 1, wherein the leaving group of the toxic chemical agent includes one or more halide ions, a thiolate, an amine, an alcohol, a perfluoroalkylsulfonate, a tosylate, cyanide, or combinations thereof, and a remaining electrophile includes a phosphorus, a sulfur, an arsenic, or a nitrogen.

### Claim 3 (depends on 1)

A method of preparing a detoxifying substrate, the method comprising:
selecting a first composition according to claim 1 and according to a first expected toxic chemical agent exposure;
applying a quantity of the first selected composition to the substrate; and
optionally drying the substrate.

### Claim 4 (depends on 1, 3)

The method of claim 3, further comprising:
selecting a second composition according to claim 1 and according to a second expected chemical agent exposure;
applying a quantity of the second selected composition to the substrate; and
optionally drying the substrate.

### Claim 5 (depends on 4)

The method of claim 4, wherein a combined quantity of the first and second compositions does not exceed 20 wt. %.

### Claim 6 (depends on 3)

The method of claim 3, wherein drying the substrate includes applying an electromagnetic radiation, applying irradiative heat, changing pH, or combinations thereof.

### Claim 7 (depends on 1)

A method of detoxifying a contaminated substrate, the method comprising:
selecting a composition according to claim 1 and according to the contamination of the substrate; and
applying a quantity of the selected compound to the contaminated substrate.

### Claim 8 (depends on 7)

The method of claim 7, further comprising:
drying the substrate after applying the quantity of the selected composition.