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US 10,113,022 B2Granted
Photoresist polymers and methods of forming patterns
AssigneeSamsung Electronics Co., Ltd.
InventorsJin Park, Hyun-Woo Kim
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Abstract
A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.
Claims6
A photoresist polymer synthesized from a repeating unit, the repeating unit comprising:
- a first leaving group including an ester group;
- and
- a second leaving group capable of being removed with the first leaving group,
- wherein the first leaving group and the second leaving group are positioned in one of a staggered conformation and an anti-periplanar configuration,
- wherein the repeating unit is represented by one of Chemical Formula 3 and Chemical Formula 4:
- wherein, in Chemical Formulae 3 and 4, R1 and R3 are independently one of hydrogen, a C1-C20 alkyl group, a C3-C10 cycloalkyl group, a C6-C30 aromatic group and a combination thereof,
- R2 is a divalent group selected from one of styrene, hydroxystyrene, acrylate, C1-C6 alkylene, arylene, carbonyl, oxy, a C2-C30 unsaturated aliphatic group and a combination thereof, and
- X is one of fluorine (F), chlorine (Cl), bromine (Br) and iodine (I).
5 more elements
A photoresist polymer synthesized from a repeating unit, the repeating unit comprising:
- a first leaving group including an ester group:
- and
- a second leaving group capable of being removed with the first leaving group,
- wherein the first leaving group and the second leaving group are positioned in one of a staggered conformation and an anti-periplanar configuration,
- wherein the repeating unit is represented by Chemical Formula 5:
- wherein, in Chemical Formula 5, each of R1, R2 and R5 are independently one of hydrogen, a C1-C20 alkyl group, a C3-C10 cycloalkyl group, a C6-C30 aromatic group and a combination thereof, and R1, R2 and R5 are the same as or different from each other,
- each of X1 and X2 are independently one of F, Cl, Br and I, and X1 and X2 are the same as or different from each other, and
- n is an integer greater than 1.
5 more elements
A photoresist polymer synthesized from a repeating unit, the repeating unit comprising:
- a first leaving group including an ester group;
- and
- a second leaving group capable of being removed with the first leaving group,
- wherein the first leaving group and the second leaving group are positioned in one of a staggered conformation and an anti-periplanar configuration,
- wherein the second leaving group includes a tosylate group.
2 more elements
Dependencies are inferred from the claim text.