Process for producing an electromechanical device

A Method for producing an electromechanical device from a substrate, called the base substrate, the base substrate comprising an intermediate layer placed between a lower layer and an upper layer, each layer lying parallel to a plane, called the plane of the substrate, the process comprising the following steps:

• a) etching the upper layer so as to form first apertures, transversely to the plane of the substrate, the first apertures extending through the upper layer to the intermediate layer;
• b) removing a portion of the intermediate layer lying between the first apertures, so as to form an empty cavity in the intermediate layer, said empty cavity lying, in the plane of the substrate, between the first apertures, and below the upper layer;
• c) forming a blocking layer on the upper layer, the blocking layer covering the first apertures formed in step a), the blocking layer and the upper layer forming a suspended microstructure lying above the cavity formed in step b), between the first apertures;
• d) producing a boundary trench in the suspended microstructure formed in step c), the boundary trench opening onto the cavity formed in step b), the boundary trench separating the suspended microstructure into a fixed portion and a movable portion, the movable portion being able to deform and overhanging the cavity, the movable portion forming a movable member of the electromechanical device.