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US 10,103,040 B1Granted
Apparatus and method for manufacturing a semiconductor device
AssigneeASM IP Holding B.V.
InventorsTheodorus Oosterlaken, Chris de Ridder, Lucian Jdira
Life of this patent
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Abstract
The invention relates to an apparatus for manufacturing a semiconductor device comprising a reaction chamber comprising a substrate holder for holding a substrate; and, a heater for heating the substrate. The heater may comprise a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate held by the substrate holder to heat the substrate.
Claims23
An apparatus for manufacturing a semiconductor device comprising:
- a reaction chamber provided with a substrate holder for holding a substrate;
- and,
- a heater for heating the substrate;
- wherein the heater comprises a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate in the apparatus,
- wherein the substrate holder is a substrate rack for holding a plurality of semiconductor substrates in a spaced apart relationship, the substrate rack comprising at least one support member defining a plurality of spaced apart substrate holding provisions, each of which substrate holding provisions is configured to independently hold a substrate in a substantially horizontal orientation and the vertical cavity surface emitting laser is constructed and arranged to emit radiation to the substrates in the substrate rack at least from a side of the substrate rack.
2 more elements
An apparatus for manufacturing a semiconductor device comprising:
- a reaction chamber provided with a substrate holder for holding a substrate;
- and,
- a heater for heating the substrate;
- wherein the heater comprises a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate in the apparatus,
- wherein the heater comprises a pre-heater to pre-heat the substrate and a final heater to heat the substrate at a final temperature and a substrate handler for moving the substrate from the pre-heater to the final heater and the vertical cavity surface emitting lasers to emit radiation to the substrate is provided in the pre-heater.
2 more elements
A method for producing a semiconductor device, comprising:
- providing an apparatus for manufacturing a semiconductor device comprising:
- a reaction chamber provided with a substrate holder for holding a substrate;
- and,
- a heater for heating the substrate;
- wherein the heater comprises a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate in the apparatus,
- wherein the substrate holder is a substrate rack for holding a plurality of semiconductor substrates in a spaced apart relationship, the substrate rack comprising at least one support member defining a plurality of spaced apart substrate holding provisions, each of which substrate holding provisions is configured to independently hold a substrate in a substantially horizontal orientation and the vertical cavity surface emitting laser is constructed and arranged to emit radiation to the substrates in the substrate rack at least from a side of the substrate rack;
- providing a substrate;
- and
- heating the substrate with the vertical cavity surface emitting laser.
6 more elements
Dependencies are inferred from the claim text.