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US 10,103,008 B2Granted
Charged particle beam-induced etching
AssigneeFEI Company
InventorClive D. Chandler
Life of this patent
Estimating the term…
Abstract
A micromachining process includes exposing the work piece surface to a precursor gas including a compound having an acid halide functional group; and irradiating the work piece surface with a beam in the presence of the precursor gas, the precursor gas reacting in the presence of the particle beam to remove material from the work piece surface.
Claims17
A method of beam-initiated etching of a work piece, comprising:
- exposing the work piece surface to a precursor gas comprising oxalyl chloride, oxalyl bromide, of a combination thereof;
- and
- irradiating the work piece surface with a beam in the presence of the precursor gas such that the beam induces decomposition of the precursor gas in the presence of the beam,
- wherein a decomposition product of the precursor gas etches the work piece by undergoing a reaction with the work piece surface that results in formation of a volatile compound comprising material from the work piece, the formation of the volatile compound removing the material from the work piece.
1 more element
A method of etching a workpiece using a charged particle beam, comprising:
- exposing a surface of a workpiece to a precursor gas comprising at least one compound selected from the group consisting of oxalyl chloride and oxalyl bromide;
- and
- irradiating the surface of the workpiece with a beam in the presence of the precursor gas, the beam inducing decomposition of the precursor gas, the precursor gas decomposing in the presence of the beam,
- wherein a decomposition product of the precursor gas etches the workpiece by undergoing a reaction with the surface of the workpiece that forms a volatile compound comprising material from the workpiece, the formation of the volatile compound removing the material from the workpiece.
1 more element
Dependencies are inferred from the claim text.