Evaporation method and evaporation device

Abstract

The present invention discloses an evaporation method and an evaporation device. The evaporation method includes successively providing at least one mask above a base substrate and forming at least one evaporation sub-pattern on the base substrate by an evaporation process so that an evaporation pattern is formed on the base substrate, wherein the evaporation pattern is constituted by the at least one evaporation sub-pattern. As the evaporation pattern finally formed is constituted by the at least one evaporation sub-pattern, only a small number of opening regions are required to be formed on each of the masks used for forming the evaporation sub-patterns compared with the prior art, so that the widths of the shield regions between the adjacent opening regions may be set to be larger.

Dependencies are inferred from the claim text.