Manufacturing method for quantum dot color film substrate and quantum dot color film substrate

A quantum dot color film substrate, comprising a substrate, a color filter layer on the substrate and a quantum dot layer on the color filter layer;

• wherein the substrate comprises a red sub-pixel region, a green sub-pixel region and blue sub-pixel region;
• the color filter layer comprises a red colored barrier layer, a green colored barrier layer and an organic transparent photoresist layer corresponding to the red sub-pixel region, the green sub-pixel region and the blue sub-pixel region;
• the quantum dot layer comprises a first quantum dot layer on the red sub-pixel region and the green sub-pixel region and a second quantum dot layer on the blue sub-pixel region;
• the quantum dot layer is formed by a quantum dot adhesive;
• the quantum dot adhesive is formed by mixing a red quantum dot material, green quantum dot material and photoinitiator in a thermosetting adhesive;
• the red quantum dot material and the green quantum dot material in the first quantum dot layer are excited by blue light to emit red and green light under excitation of blue light;
• the quantum dot material in the second quantum dot layer is fluorescence quenched by the photoinitiator under UV illumination and the quantum dot material in the second quantum dot layer does not emit light under illumination;
• and
• the quantum dot color film substrate is used in a blue backlight display device;
• wherein the display device is a liquid crystal display device, organic light-emitting display device or quantum dot light emitting display device;
• further comprising a filter layer on the first quantum dot layer, wherein the filter layer is formed on the first quantum dot layer to filter out blue light below 400 nm wavelength, for preventing the photoinitiator in the first quantum dot layer on quenching the quantum dot material by ultraviolent;
• and
• wherein a thickness of the quantum dot layer is 0.5-20 μm.