Maintenance method of substrate processing apparatus, method for manufacturing semiconductor device, substrate processing apparatus, and storage medium capable of reading maintenance program of substrate processing apparatus

A method for manufacturing a semiconductor device, comprising:

• a first processing step of carrying a first substrate holder holding a substrate into a process chamber and processing the substrate held by the first substrate holder within the process chamber;
• a second processing step of carrying a second substrate holder holding a substrate into the process chamber and processing the substrate held by the second substrate holder within the process chamber;
• a determination step of determining a replacement timing of the first substrate holder and the second substrate holder;
• a shutdown step including a temperature reducing process of cooling the process chamber, the first substrate holder and the second substrate holder to a predetermined temperature;
• a maintenance step of replacing the first substrate holder and the second substrate holder respectively with a third substrate holder and a fourth substrate holder;
• a startup step of performing a startup process including a temperature increasing process of heating the process chamber,
• wherein if at least one of the first substrate holder and the second substrate holder reaches the replacement timing, the shutdown step, the maintenance step, and the startup step are performed at the replacement timing that is determined in the determination step;
• a first mounting step of mounting the substrate to the first substrate holder in at least a substrate transfer position;
• a first removal step of removing the substrate from the first substrate holder in the substrate transfer position;
• and
• a substrate holder selection step of, if a processing interruption state in which the first mounting step cannot be implemented due to an absence of the substrate to be mounted to the first substrate holder at the first mounting step is generated after the first removal step, selecting the substrate holder to be initially carried into the process chamber after elimination of the processing interruption state, depending on a processing history of each of the first substrate holder and the second substrate holder.

A non-transitory computer-readable recording medium for readably storing a maintenance program of a substrate processing device which causes a computer to execute:

• a first processing procedure of carrying a first substrate holder holding a substrate into a process chamber and processing the substrate held by the first substrate holder within the process chamber;
• a second processing procedure of carrying a second substrate holder holding a substrate into the process chamber and processing the substrate held by the second substrate holder within the process chamber;
• a determination procedure of determining a replacement timing of the first substrate holder and the second substrate holder;
• a shutdown procedure including a temperature reducing process of cooling the process chamber, the first substrate holder and the second substrate holder to a predetermined temperature;
• a maintenance procedure of bring the first substrate holder and the second substrate holder into an empty state in which the first substrate holder and the second substrate holder do not hold a substrate;
• a startup procedure of performing a startup process including a temperature increasing process of heating the process chamber,
• wherein if at least one of the first substrate holder and the second substrate holder reaches the replacement timing, the shutdown procedure, the maintenance procedure, and the startup procedure are performed at the replacement timing that is determined in the determination procedure;
• a first mounting step of mounting the substrate to the first substrate holder in at least a substrate transfer position;
• a first removal step of removing the substrate from the first substrate holder in the substrate transfer position;
• and
• a substrate holder selection step of, if a processing interruption state in which the first mounting step cannot be implemented due to an absence of the substrate to be mounted to the first substrate holder at the first mounting step is generated after the first removal step, selecting the substrate holder to be initially carried into the process chamber after elimination of the processing interruption state, depending on a processing history of each of the first substrate holder and the second substrate holder.