Substrate treatment apparatus, and substrate treatment method

A substrate treatment apparatus comprising:

• a treatment chamber;
• a substrate holding mechanism provided in the treatment chamber for holding a substrate;
• a tubular treatment cup provided in the treatment chamber and surrounding the substrate holding mechanism;
• a first chemical liquid nozzle which spouts a first chemical liquid to the substrate held by the substrate holding mechanism;
• a second chemical liquid nozzle which spouts a second chemical liquid different from the first chemical liquid to the substrate held by the substrate holding mechanism;
• a first moving mechanism which moves the first chemical liquid nozzle between a first outer space and an upper position above the substrate held by the substrate holding mechanism, the first outer space being a predetermined space defined outside the treatment cup in the treatment chamber;
• a second moving mechanism which moves the second chemical liquid nozzle between a second outer space different from the first outer space and the upper position above the substrate held by the substrate holding mechanism, the second outer space being a predetermined space defined outside the treatment cup in the treatment chamber;
• a first vat disposed at least in a bottom of the first outer space for receiving liquid from above and guiding the received liquid toward a first drain port;
• and
• a second vat disposed in a bottom of the second outer space for receiving liquid from above and guiding the received liquid toward a second drain port different from the first drain port;
• wherein at least bottom portions of the first outer space and the second outer space are isolated from each other.