Substrate processing method and storage medium

A substrate processing method for removing a fluorine-containing organic solvent, which has been supplied to a surface of a substrate, having a pattern formed in the surface, after processing of the substrate with a liquid and which covers the surface of the substrate, from the surface of the substrate by bringing the solvent into contact with a high-pressure fluid, said method comprising the steps of:

• carrying the substrate to a processing container, the surface of the substrate being covered with a first fluorine-containing organic solvent, the first fluorine-containing organic solvent having a first boiling point, the first boiling point being one of 165° C. or 174° C., and evaporating, while the substrate is being carried to the processing container, only an amount of the first fluorine-containing organic solvent from the substrate, the amount maintaining, for a selected amount of time, while the substrate is being carried to the processing container, the surface of the substrate wet with the first fluorine-containing organic solvent, the selected amount of time being based on a selected volume of the first fluorine-containing organic solvent necessary to cover the surface of the substrate, the size of the substrate, and the first boiling point;
• forming a high-pressure fluid atmosphere of a mixture of the first fluorine-containing organic solvent and a second fluorine-containing organic solvent, the second fluorine-containing organic solvent having a second boiling point, the second boiling point being lower than the first boiling point of the first fluorine-containing organic solvent, and a critical temperature, the critical temperature of the second fluorine-containing organic solvent being higher than the first boiling point of the first fluorine-containing organic solvent, and forming a supercritical fluid at a critical temperature which prevents release of fluorine atoms due to decomposition of the first and second fluorine-containing organic solvents, in the processing container;
• supplying a high-pressure fluid of the second fluorine-containing organic solvent into the processing container, or by supplying a gas or liquid of the second fluorine-containing organic solvent into the processing container and then heating the gas or liquid to a temperature not less than the critical temperature of the second fluorine-containing organic solvent to turn the gas or liquid into a high-pressure fluid;
• and then
• discharging a fluid in the state of a high-pressure fluid or a gas from the processing container.