Pattern measurement device and computer program
AssigneeHitachi High-Technologies Corporation
InventorsHitoshi Namai, Tomoaki Yamazaki
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AssigneeHitachi High-Technologies Corporation
InventorsHitoshi Namai, Tomoaki Yamazaki
Estimating the term…
The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.
A pattern measurement device comprising:
A non-transitory computer-readable medium storing a program causing a computer to use a waveform signal obtained by scanning the pattern with a charged particle beam to measure a measurement target pattern,
Dependencies are inferred from the claim text.