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US 10,096,447 B1Granted
Electron beam apparatus with high resolutions
AssigneeKLA-Tencor Corporation
InventorsXinrong Jiang, Christopher Sears
Life of this patent
Estimating the term…
Abstract
A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An extracted beam can be directed at a wafer through a beam limiting aperture using the magnetic gun lens. The electron beam also can pass through an electrostatic gun lens after the electron beam passes through the beam limiting aperture.
Claims18
An electron beam apparatus comprising:
- an electron source, wherein the electron source includes:
- a tip configured to emit electrons;
- a suppressor;
- and
- an extractor;
- a first electrostatic anode, wherein the first electrostatic anode is grounded;
- a beam limiting aperture disposed between the electrostatic anode and the electron source;
- a magnetic gun lens that includes a plurality of pole pieces and coils, wherein the magnetic gun lens is disposed on either side of the electron source, first electrostatic anode, and beam limiting aperture;
- an electrostatic gun lens disposed on an opposite side of the beam limiting aperture from the first electrostatic anode;
- and
- a second electrostatic anode, wherein the second electrostatic anode is grounded and is disposed on an opposite side of the electrostatic gun lens from the first electrostatic anode.
8 more elements
A method comprising:
- generating an electron beam with an electron source;
- extracting the electron beam with an extractor;
- directing the electron beam at a wafer through a beam limiting aperture using a magnetic gun lens that includes a plurality of pole pieces and coils and is disposed on either side of the beam limiting aperture;
- and
- passing the electron beam through an electrostatic gun lens after the electron beam passes through the beam limiting aperture.
2 more elements
Dependencies are inferred from the claim text.