Mechanical oscillator and associated production method
AssigneeTronics Microsystems S.A.
InventorsVincent Gaff, Pierre-Marie Visse, Luca Ribetto
Life of this patent
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Abstract
A mechanical oscillator endowed with a strip, with the aforesaid strip incorporating a first silicon layer having a crystal lattice extending along a first direction of one plane, a thermal compensation layer composed of a material having a Young's modulus thermal coefficient of opposite sign to that of the silicon, and a second silicon layer having a crystal lattice extending in a second direction of the plane, with the first and direction being offset at an angle of 45° within the plane of the layers, and with the thermal compensation layer extending between the first and second silicon layers.
Claims15
A mechanical oscillator endowed with a strip, the strip comprising:
- a first silicon layer having a crystal lattice extending along a first direction of a plane;
- and
- a thermal compensation layer made of a material having a thermal coefficient of the Young's modulus of opposite sign to that of the silicon;
- wherein the strip also comprises a second silicon layer having a crystal lattice extending along a second direction of the plane,
- the first and the second direction being offset by an angle of 45° within the plane of the layers, and
- the thermal compensation layer extending between the first and second silicon layers.
A method for manufacturing a mechanical oscillator endowed with a strip comprising a first silicon layer having a crystal lattice extending along a first direction of a plane, a thermal compensation layer made of a material having a thermal coefficient of the Young's modulus of opposite sign to that of the silicon, wherein the strip also comprises a second silicon layer having a crystal lattice extending along a second direction of the plane, the first and second direction being offset by an angle of 45° within the plane of the layers and the thermal compensation layer extending between the first and second silicon layers, the method comprising:
- etching a pattern of the mechanical oscillator onto the first silicon layer and onto the thermal compensation layer and the second silicon layer.
Dependencies are inferred from the claim text.