Detection apparatus, lithography apparatus, method of manufacturing article, and detection method
AssigneeCanon Kabushiki Kaisha
InventorTakuro Tsujikawa
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AssigneeCanon Kabushiki Kaisha
InventorTakuro Tsujikawa
Estimating the term…
The present invention provides a detection apparatus which detects a position of a mark on a substrate, the apparatus comprising an image capturing unit having an image sensor configured to capture an image of the mark, and a processor configured to control the image capturing unit such that second image capturing is performed after first image capturing is performed, and determine the position of the mark based on an image obtained by the second image capturing, wherein the processor controls the first image capturing such that an accumulation period of charges in the image sensor becomes shorter than that in the second image capturing, and determines an image capturing condition of the second image capturing based on an output of the image sensor in the first image capturing.
A detection apparatus which detects a position of a mark on a substrate, the apparatus comprising:
A lithography apparatus which forms a pattern on a substrate, the apparatus comprising:
A method of manufacturing an article, the method comprising:
A detection method of detecting a position of a mark on a substrate held by a stage which is configured to be movable while holding the substrate, the method comprising:
A detection apparatus which detects a position of a mark on a substrate, the apparatus comprising:
A detection apparatus which detects a position of a mark on a substrate, the apparatus comprising:
Dependencies are inferred from the claim text.