Imprint apparatus

An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the imprint apparatus comprising:

• a mold holding mechanism configured to hold the mold;
• a substrate holding unit configured to hold the substrate;
• an imaging device configured to obtain an image of a contact region at which the mold deformed into a convex shape toward the substrate is brought into contact with the imprint material;
• a driving unit configured to change an angle of a holding surface of the mold in the mold holding mechanism with respect to a holding surface of the substrate in the substrate holding unit;
• and
• a control unit configured to control the driving unit such that the angle is changed, based on the image obtained by the imaging device during a releasing operation in which the mold is released from the imprint material,
• wherein the control unit is further configured to control the driving unit such that the angle is changed, based on a plane coordinate position of a centroid of the contact region and a plane coordinate position of the center of a pattern-forming region on the substrate.

An imprint method for forming a pattern of an imprint material on a substrate using a mold, the imprint method comprising steps of:

• obtaining an image of the imprint material of a contact region at which the mold is brought into contact with the imprint material;
• and
• changing an angle of a pattern section of the mold with respect to a surface of the substrate, based on the obtained image during a releasing operation in which the mold is released from the imprint material,
• wherein the angle is changed based on a plane coordinate position of a centroid of the contact region and a plane coordinate position of the center of a pattern-forming region on the substrate.

An article manufacturing method comprising steps of:

• forming a pattern in a substrate using the imprint apparatus that forms a pattern of an imprint material on the substrate using a mold;
• and
• processing the substrate on which the pattern has been formed in the forming step,
• wherein the imprint apparatus comprises:
• an imaging device configured to obtain an image of the imprint material of a contact region at which the mold is brought into contact with the imprint material;
• and
• a control unit configured to change an angle of a pattern section of the mold with respect to a surface of the substrate, based on the image obtained by the imaging device during a releasing operation in which the mold is released from the imprint material,
• wherein the control unit is further configured to change the angle based on a plane coordinate position of a centroid of the contact region and a plane coordinate position of the center of a pattern-forming region on the substrate.