Process chamber for field guided exposure and method for implementing the process chamber
AssigneeApplied Materials, Inc.
InventorsKartik Ramaswamy, Srinivas D. Nemani
Life of this patent
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Abstract
A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.
Claims14
A processing chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body;
- and
- an electrode assembly configured to couple to a power source, the electrode assembly comprising:
- a top plate disposed above the substrate support;
- a bottom plate having an opening therethough, wherein a portion of the substrate support is disposed through the opening;
- and
- a plurality of electrodes in a cylindrical arrangement connecting the top plate to the bottom plate, wherein at least one electrode of the plurality of electrodes is operable to disengage from the bottom plate.
A processing chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body;
- and
- an electrode assembly disposed in a processing volume defined by the chamber body and configured to couple to a power source, the electrode assembly comprising:
- a top plate disposed above the substrate support;
- a bottom plate disposed below the substrate support;
- and
- a plurality of electrodes in a cylindrical arrangement connecting the top plate to the bottom plate, each electrode in the plurality of electrodes having a first end and a second end, the first end contacting the top plate and the second end contacting the bottom plate, wherein a portion of the plurality of electrodes is operable between a position where the second end of the electrode contacts the bottom plate and a position where the second end of the electrode is spaced from the bottom plate.
A processing chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body coupled to a shaft;
- and
- an electrode assembly configured to couple to a power source, the electrode assembly comprising:
- a top plate disposed above the substrate support;
- a bottom plate disposed below the substrate support surrounding the shaft;
- and
- a plurality of electrodes in a cylindrical arrangement within the chamber body connecting the top plate to the bottom plate, wherein a portion of the plurality of electrodes is displaced vertically to electrically connect and disconnect the top plate to the bottom plate.
Dependencies are inferred from the claim text.