Pattern forming method, method for manufacturing electronic device, and electronic device

A pattern forming method comprising:

• (1) a step of forming a film with an active-light-sensitive or radiation-sensitive resin composition containing the following (A) to (C):
• (A) a resin having a repeating unit having a phenolic hydroxyl group, and having a group that decomposes by the action of an acid to generate a polar group,
• (B) a compound that generates an acid upon irradiation with active light or radiation, and
• (C) a compound having a cationic site and an anionic site in the same molecule, in which the cationic site and the anionic site are linked to each other via a covalent bond;
• (2) a step of exposing the film;
• and
• (3) a step of developing the exposed film using a developer including an organic solvent to form a negative tone pattern,
• wherein the compound (C) is a compound represented by the following General Formula (C-1):
• (Rxn2-X⊕-L-A⊖ (C-1)
• in which A− represents an organic acid anion, L represents a single bond or a divalent linking group, and X+ represents a nitrogen cation or an iodine cation;
• Rx represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, or a heterocyclic group, in a case where Rx's are present in plural numbers, a plurality of Rx's may be the same as or different from each other, and at least one of n2 Rx's has 5 or more carbon atoms;
• and
• in a case where X+ represents a nitrogen cation, n2 represents 3, and in a case where X+ represents an iodine cation, n2 represents 1.