Spacer and manufacturing device for the same
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorsHuan Liu, Zui Wang, Jinbo Guo, Shih-hsun Lo
Life of this patent
Estimating the term…
Loading patent…
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorsHuan Liu, Zui Wang, Jinbo Guo, Shih-hsun Lo
Estimating the term…
A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.
A spacer manufacturing device, comprising:
A spacer which is manufactured by a spacer manufacturing device, wherein the spacer manufacturing device comprises a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region;
Dependencies are inferred from the claim text.