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US 10,094,791 B2Granted
Pattern inspection apparatus
AssigneeNuFlare Technology, Inc.
InventorNobutaka Kikuiri
Life of this patent
Estimating the term…
Abstract
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a first stage to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated with the multi-beams, a second stage, arranged on the first stage, to be able to move up to a second stroke sufficiently shorter than the first stroke and to place the substrate thereon, and a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams.
Claims6
A pattern inspection apparatus comprising:
- a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
- a first stage configured to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated with the multi-beams;
- a second stage arranged on the first stage and configured to be able to move up to a second stroke shorter than the first stroke and to place the substrate thereon, the second stage being relatively moved in a direction opposite to that of the first stage;
- a detector configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams;
- a first stage drive mechanism configured to continuously move the first stage;
- and
- a second stage drive mechanism configured, for each of a plurality of small regions of the substrate, to relatively move the second stage in a direction opposite to that of the first stage such that a position of the substrate does not move in a movement direction of the first stage with respect to the column while a small region concerned of the plurality of small regions is scanned by the multi-beams, wherein
- the second stage repeats moving and stopping in the direction opposite to that of the first stage, in a range of the second stroke, on the first stage which moves continuously.
5 more elements
A pattern inspection apparatus comprising:
- a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
- a first stage configured to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated with the multi-beams;
- a second stage arranged on the first stage and configured to be able to move up to a second stroke shorter than the first stroke and to place the substrate thereon, second stage being relatively moved in a direction opposite to that of the first stage;
- and
- a detector configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams;
- a first stage drive mechanism configured to move the first stage;
- and
- a second stage drive mechanism configured, for each of a plurality of small regions of the substrate, to make the second stage repeat moving and stopping in a predetermined direction in a range of the second stroke, while the first stage remains stopped, such that a small region concerned of the plurality of small regions is scanned by the multi-beams, wherein
- in a case where a relative movement amount of the second stage needs to be an amount exceeding the second stroke with respect to the column, the first stage is moved, and a relative position of the second stage to the first stage is returned to an original position while the first stage is moving.
6 more elements
A pattern inspection apparatus comprising:
- a column configured to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams;
- a first stage configured to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated with the multi-beams;
- a second stage arranged on the first stage and configured to be able to move up to a second stroke shorter than the first stroke and to place the substrate thereon, the second stage being relatively moved in a direction opposite to that of the first stage;
- and
- a detector configured to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, wherein
- the column is configured to irradiate the substrate with the multi-beams in a state where the substrate remains stopped relative to the column by a relative movement between the first stage and the second stage.
3 more elements
Dependencies are inferred from the claim text.