Method for producing single crystal with reduced number of crystal defects
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsShou Takashima, Yuuichi Miyahara, Atsushi Iwasaki
Life of this patent
Estimating the term…
Loading patent…
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsShou Takashima, Yuuichi Miyahara, Atsushi Iwasaki
Estimating the term…
A method for producing a single crystal, wherein the space is adjusted to a predetermined distance by measuring a distance from a reference height position at a predetermined height above a melt surface to a lower end part of an in-furnace structure in a state wherein the in-furnace structure above the melt surface is installed in a pull chamber, obtaining a lower end part position error which is a difference between measured distance and a distance from the previously set reference height position to the lower end part of the in-furnace structure, obtaining a target distance from the melt surface to the reference height position by adding the lower end part position error and a distance from the reference height position to a melt surface position, and adjusting a distance from an initial position of the melt surface to the reference height position such that the target distance is attained.
A method for producing a single crystal, the method by which, when a single crystal is grown by a Czochralski method by pulling the single crystal upwardly by a wire from raw material melt in a crucible, a single crystal is grown by adjusting a space between a melt surface of the raw material melt and a lower end part of an in-furnace structure which is disposed above the melt surface to a predetermined distance, wherein
Dependencies are inferred from the claim text.