Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer

A composition for forming a silica based layer,

• comprising a silicon-containing compound comprising polysilazane, polysiloxazane, or a combination thereof and a solvent, and
• having a turbidity increasing rate of about 0.005 to about 0.027,
• wherein the solvent comprises at least one selected from trimethylbenzene, triethylbenzene, decahydronaphthalene, tetrahydronaphthalene, indene, diethylbenzene, and methylnaphthalene, and
• wherein the turbidity increasing rate is defined by Relationship Equation 1, and a gelation time in the Relationship Equation 1 is measured at temperature of about 23° C. ±about 2° C. under a relative humidity of about 50% ±about 10%:
• Turbidity increasing rate (NTU/hr) =(Turbidity at gelation−Initial turbidity)/Gelation time. Relationship Equation 1