Resist composition, patterning process, and barium, cesium and cerium salts
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Takeshi Sasami, Masaki Ohashi
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Abstract
A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
Claims12
A resist composition comprising a base resin comprising recurring units containing an acid labile group and a salt,
- wherein the salt is a barium salt having the formula (2), a cesium salt having the formula (3) or a cerium salt having the formula (4):
- wherein R6 is a C4-C20 straight, branched or cyclic alkyl, alkenyl or alkynyl group or C6-C20 aryl group, which may contain halogen, ether, thiol, ester, carbonate, carbonyl, amide, amino, azide, carbamate, nitro, cyano, hydroxyl, carboxyl, sulfo, sulfonic acid ester, sultone moiety, lactone ring or lactam ring.
A barium salt having the formula (2), a cesium salt having the formula (3) or a cerium salt having the formula (4):
- wherein R6 is a C4-C20 straight, branched or cyclic alkyl, alkenyl or alkynyl group or C6-C20 aryl group, which may contain halogen, ether, thiol, ester, carbonate, carbonyl, amide, amino, azide, carbamate, nitro, cyano, hydroxyl, carboxyl, sulfo, sulfonic acid ester, sultone moiety, lactone ring or lactam ring.
Dependencies are inferred from the claim text.