Infrared radiation emission surface having a high thermal emissivity and a long life time and its manufacturing method

A method for manufacturing an infrared IR radiation emission surface capable of operating at high temperatures,

• the said manufacturing method comprising
• a first step consisting in providing a substrate, consisting of a thickness of a first material based on silicon carbide SiC and having a planar or curved exposure face,
• further comprising
• a second step, carried out following the first step, consisting in producing an ensemble of texturing microstructures covering the face,
• each microstructure being formed by a single protuberance made of the first material and arranged on and integrally with the substrate,
• the microstructures having the same shape and the same dimensions, and being distributed over the face of the substrate in a bidimensional periodic pattern, and
• the shape of each microstructure being smooth and regular, while having a single apex and a radius of curvature which varies continuously from the apex to the face.