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US 10,053,774 B2Granted
Reactor system for sublimation of pre-clean byproducts and method thereof
AssigneeASM IP Holding B.V.
InventorsJohn Tolle, Eric Hill
Life of this patent
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Abstract
A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.
Claims8
A reactor system comprising:
- a reaction chamber assembly defining an interior chamber;
- a susceptor within the interior chamber;
- a wafer tray seated on the susceptor and adapted to carry a wafer;
- and
- a heating element in the wafer tray adapted to heat the wafer tray to heat the wafer to a sublimation temperature;
- wherein the wafer tray has a mass in a range of about 0.4 kilograms to about 1.5 kilograms;
- and
- wherein the wafer tray comprises a wafer tray recess configured to receive and retain the wafer, the wafer tray recess having an upwardly facing surface having a roughness average (Ra) of 0.4 μm or less across the entire upwardly facing surface.
5 more elements
Dependencies are inferred from the claim text.