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US 10,043,661 B2Granted
Method for protecting layer by forming hydrocarbon-based extremely thin film
AssigneeASM IP Holding B.V.
InventorsRichika Kato, Ryu Nakano
Life of this patent
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Abstract
A method for protecting a layer includes: providing a substrate having a target layer; depositing a protective layer on the target layer, which protective layer contacts and covers the target layer and is constituted by a hydrocarbon-based layer; and depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized. The hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
Claims13
A method for protecting a layer, comprising:
- providing a substrate having a target layer;
- depositing a protective layer on the target layer, said protective layer contacting and covering the target layer and constituted by a hydrocarbon-based layer, said hydrocarbon-based layer being formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant;
- and
- depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized.
1 more element
Dependencies are inferred from the claim text.