Back to results
US 10,026,822 B2Granted
Fabrication of nanoscale vacuum grid and electrode structure with high aspect ratio dielectric spacers between the grid and electrode
AssigneeElwha LLC
InventorsMax N. Mankin, Tony S. Pan
Life of this patent
Estimating the term…
Abstract
Some embodiments of vacuum electronics call for a grid that is fabricated in close proximity to an electrode, where, for example, the grid and electrode are separated by nanometers or microns. Methods and apparatus for fabricating a nanoscale vacuum grid and electrode structure are described herein.
Claims22
A multi-layer electrode-grid structure comprising:
- a substrate;
- a layer of a first material on the substrate, the layer of the first material forming an electrode;
- a layer of a second material on the first material, the second material including a dielectric;
- and
- a patterned layer of a third material on the second material, wherein the patterned layer of the third material forms a grid, the layer of a second material having a pattern defined by a pattern of the grid;
- wherein the layer of a second material has a width and a height, the layer of a second material having a ratio of the height to the width between 2/1 and 50/1.
3 more elements
Dependencies are inferred from the claim text.