US 10,026,609 B2 · Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures

Abstract

A method for template fabrication of ultra-precise nanoscale shapes. Structures with a smooth shape (e.g., circular cross-section pillars) are formed on a substrate using electron beam lithography. The structures are subject to an atomic layer deposition of a dielectric interleaved with a deposition of a conductive film leading to nanoscale sharp shapes with features that exceed electron beam resolution capability of sub-10 nm resolution. A resist imprint of the nanoscale sharp shapes is performed using J-FIL. The nanoscale sharp shapes are etched into underlying functional films on the substrate forming a nansohaped template with nanoscale sharp shapes that include sharp corners and/or ultra-small gaps. In this manner, sharp shapes can be retained at the nanoscale level. Furthermore, in this manner, imprint based shape control for novel shapes beyond elementary nanoscale structures, such as dots and lines, can occur at the nanoscale level.

Claims30

Dependent claims

A method for template fabrication of ultra-precise nanoscale shapes, the method comprising:

forming structures with a smooth shape on a substrate using lithography;
subjecting said structures to an atomic layer deposition of one or more films leading to nanoscale sharp shapes with features that exceed lithography resolution capability of sub-10 nm resolution;
performing a resist imprint of said nanoscale sharp shapes using imprint lithography;
and
etching said nanoscale sharp shapes into underlying functional films on said substrate forming a nanoshaped template with nanoscale sharp shapes that comprise one or more of the following:
sharp corners and ultra-small gaps ranging from 1 to 10 nanometers.

3 more elements

Dependencies are inferred from the claim text.

Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures

Life of this patent

Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures

Life of this patent

Abstract

Claims30