Treatment solution supply method, treatment solution supply apparatus, and non-transitory computer-readable recording medium
AssigneeTokyo Electron Limited
InventorsMasato Hayashi, Toyohisa Tsuruda, Masayuki Kajiwara
Life of this patent
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Abstract
A treatment solution supply method of supplying a treatment solution to a substrate, the method includes the steps of: applying a DC voltage to the treatment solution; detecting a potential difference between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution; and increasing the DC voltage when the detected potential difference is less than a predetermined reference value.
Claims15
A treatment solution supply method of supplying a treatment solution to a substrate, the method comprising the steps of:
- applying a DC voltage to the treatment solution;
- detecting a current flowing between two points in the treatment solution, or detecting the current and a potential difference between the two points in a state where the DC voltage is applied to the treatment solution;
- and
- increasing the DC voltage when the detected current is more than a predetermined reference current, or when the detected current is more than the predetermined reference current and the detected potential difference is less than a reference potential difference.
A treatment solution supply apparatus configured to supply a treatment solution to a substrate, the apparatus comprising:
- a treatment solution supply pipe that supplies the treatment solution to the substrate;
- an electrode pair that is provided in the treatment solution supply pipe and applies a DC voltage to the treatment solution in the treatment solution supply pipe;
- a DC power supply that applies the DC voltage to the electrode pair;
- and
- a processor and a memory, the processor controls the DC power supply,
- wherein the treatment solution supply apparatus further comprises:
- a current detector that detects a current flowing between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution, or
- the current detector and a potential difference detector that detects a potential difference between two points in the treatment solution supply pipe separate from each other in a facing direction of the electrode pair in a state where the DC voltage is applied to the treatment solution;
- wherein the processor is configured to execute a program stored in the memory to:
- control the DC power supply to increase the DC voltage when the detected current is more than a predetermined reference current, or when the detected current is more than the predetermined reference current and the potential difference detected by the potential difference detector is less than a reference potential difference.
A non-transitory computer-readable recording medium recording a program thereon for causing a treatment solution supply apparatus configured to supply a treatment solution to a substrate to perform a treatment solution supply method of supplying a treatment solution to a substrate,
- the treatment solution supply method comprising the steps of:
- applying a DC voltage to the treatment solution;
- detecting a current flowing between two points in the treatment solution, or detecting the current and a potential difference between the two points in a state where the DC voltage is applied to the treatment solution;
- and
- increasing the DC voltage when the detected current is more than a predetermined reference current, or when the detected current is more than the predetermined reference current and the detected potential difference is less than a reference potential difference.
Dependencies are inferred from the claim text.