Vacuum exhaust method
AssigneeTokyo Electron Limited
InventorsTomohiro Saito, Tadashi Mitsunaga, Kouji Maeda, Tetsuya Miyashita
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Abstract
A vacuum exhaust method is for decreasing a pressure in a processing chamber in which a mounting table configured to mount thereon a substrate is provided by using a gas exhaust unit. The vacuum exhaust method includes mounting a non-evaporated getter (NEG) on the mounting table, and adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table. In the adsorbing the active gas, the NEG is maintained at a predetermined temperature.
Claims12
A vacuum exhaust method for decreasing a pressure in a processing chamber, in which a mounting table configured to mount thereon a substrate is provided, by using a gas exhaust unit, the method comprising:
- mounting a non-evaporated getter (NEG) on the mounting table;
- and
- adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table,
- wherein said mounting the NEG is performed when a vacuum level in the processing chamber does not reach a predetermined vacuum level in a state where a pressure in the processing chamber is decreased by the gas exhaust unit.
Dependencies are inferred from the claim text.